Environmentally harmonious etching process for cleaning amorphous silicon and tungsten in chemical vapor deposition chamber

Materials Science in Semiconductor Processing

Volumn 2, Issue 3, 1999, Pages 219-223

  Fujita, Kazushi ^a   Kobayashi, Shigeto ^a   Ito, Masafumi ^a   Hori, Masaru ^a   Goto, Toshio ^a  

^a NAGOYA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000498518     PISSN: 13698001     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1369-8001(99)00030-X     Document Type: Article

References (11)

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