Self-diffusion studies of 15N in amorphous Si3BC4.3N2 ceramics with ion implantation and secondary ion mass spectrometry

Journal of Applied Physics

Volumn 88, Issue 4, 2000, Pages 1827-1830

  Schmidt, H ^a   Borchardt, G ^a   Weber, S ^b   Scherrer, S ^b   Baumann, H ^c   Muller A ^d   Bill, J ^d  

^a CLAUSTHAL UNIVERSITY OF TECHNOLOGY   (Germany)

^b INSTITUT JEAN LAMOUR   (France)

^c GOETHE UNIVERSITY   (Germany)

^d MAX PLANCK INSTITUTE FOR INTELLIGENT SYSTEMS   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000380347     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1305903     Document Type: Article

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