Synthesis of 2-phenylallyl-ended poly(α-methylstyrene) and application for electron-beam resist

Journal of Photopolymer Science and Technology

Volumn 12, Issue 2, 1999, Pages 365-368

  Hirakawa, Naoki ^a   Tokuda, Takashi ^a   Aoki, Hidetoshi ^a   Nagasaki, Yukio ^b   Kato, Masao ^b  

^a Hokushin Corporation   (Japan)

^b TOKYO UNIVERSITY OF SCIENCE   (Japan)

Author keywords

2 phenylallyl ended polymer; Acid generator; Depolymerization; Poly( methylstyrene); Positive Electron Beam Resist

Indexed keywords

EID: 0000349398     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.12.365     Document Type: Article

References (13)

1. Nagasaki, Y., Deguchi, K., Yamazaki, N., Kato, M., Macromol, Rapid. Commun., 17, 51(1996)
2. Nagasaki, Y., Yamazaki, N., Kato, M., J. Photopolym. Sci. Technol., 10, 321 (1997)
3. Nagasaki, Y., Hirano, T., Kato, M., J. Photopolym. Sci. Technol., 11, 163 (1998)
4. Ivin, K. J., Léonard, J., Eur. Polym. J., 6, 331 (1970)
5. a) Ito, H.; England, W. P. Polym. Prep., 31, 427(1990).
6. b) Ito, H.; England, W. P., Ueda, M., J. Photopolym. Sci. Tech., 3, 219 (1990)
7. Matyjaszewski, K., "Carbcationic Polymerization: Styrene and Substituted Styrenes", in "Comprehensive Polymer Science", Vol. 3, Pergamon Press, Oxford, 1988, pp. 639-672.
8. Nagasaki, Y., Yamazaki, N., Kato, M., Macromol. Rapid Commun., 17, 123 (1996)
9. Nagasaki, Y., Yamazaki, N., Kato, M., Polymer, 37, 4321(1996)
10. Hatch, L. F., Patton, T. L. J. Am. Chem. Soc., 1954, 27, 2705.
11. a)Sugita, K. Ueno, N., Prog. Polym. Sci., 17. 319 (1992).
12. b) Choong, H. S., Kahn, F. J., J. Vac. Sci. Technol., 19, 1121 (1981)
13. Jones, R. G., Trends in Polymer Science, 1, 372 (1993)