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Volumn 10, Issue 2, 1997, Pages 321-324

2-Phenylallyl-ended poly(α-methylstyrene): A new positive electron-beam resist

Author keywords

2 phenyialiyl ended poly(a methylstyrene); Depolymerization mechanism; Positive electron beam resist

Indexed keywords


EID: 0010251684     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.10.321     Document Type: Article
Times cited : (3)

References (20)
  • 2
    • 0010251818 scopus 로고
    • An Introduction of Lithography
    • Thompson, L. F., Willson C. G., Bowden, M. J., Ed., ACS, Washington, DC, Chap. 1
    • b) Thompson, L. F., "An Introduction of Lithography", in "Introduction to Microlithography Second Edition" Thompson, L. F., Willson C. G., Bowden, M. J., Ed., ACS, Washington, DC, 1994, Chap. 1, pp. 1-17.
    • (1994) Introduction to Microlithography Second Edition" , pp. 1-17
    • Thompson, L.F.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.