2-phenylally-ended poly(α-methylstyrene) derivatives for electron-beam resist

Journal of Photopolymer Science and Technology

Volumn 11, Issue 1, 1998, Pages 163-164

  Nagasaki, Yukio ^a   Hirano, Tsuyoshi ^a   Kato, Masao ^a  

^a TOKYO UNIVERSITY OF SCIENCE   (Japan)

Author keywords

2 phenylallyl ended polymer; Acid generator; Depolymerization; Poly( methylstyrene); Positive Electron Beam Resist

Indexed keywords

EID: 0001354671     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.11.163     Document Type: Article

References (10)

1. a) Ogawa, T., J. Photopolym. Sci. Technol., 9, 379 (1996).
2. a) Kato, N., Nagasaki, Y., Kato, M., Polym. Adv. Tech., 1, 341(1990).
3. b) Aoki, H., Tokuda, T., Nagasaki, Y., Kato, M., J. Polym. Sci., Part A, Chem. Ed., 35, 2827-2833(1997)
4. Kato, N., Takeda, K., Nagasaki, Y., Kato, M., Ind. Eng. Chem. Res., 33, 417(1994).
5. Ito, H., Wilson, C. G., Polym. Eng, Sci, 23, 1012(1983)
6. Ivin, K. J., Léonard, J., Eur. Polym. J., 6, 331(1970)
7. Ito, H.; England, W. P. Polym. Prep. 1990, 31, 427.
8. b) Ito, H.; England, W. P., Ueda, M. J. Photopolym. Sci. Tech. 1990, 3, 219.
9. Nagasaki, Y.; Yamazaki, N.; Kato, M. Macromol. Rapid Commun. 1996, 17, 123.
10. Nagasaki, Y.; Yamazaki, N.; Kato, M. Polymer 1996, 37, 4321.