Ellipsometric investigation of nucleation sites for chemical vapor deposition of Si on SiO2 and Si3N4 surfaces

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 17, Issue 3, 1999, Pages 817-822

  Basa, C ^a   Irene, E A ^a  

^a University of North Carolina at Chapel Hill   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000278894     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.581653     Document Type: Article

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