Real time investigation of nucleation and growth of silicon on silicon dioxide using silane and disilane in a rapid thermal processing system

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 14, Issue 2, 1996, Pages 744-750

  Hu, Y Z ^a   Diehl, D J ^a   Zhao, C Y ^a   Wang, C L ^a   Liu, Q ^a   Irene, E A ^a   Christensen, K N ^b   Venable, D ^b   Maher, D M ^b  

^a University of North Carolina at Chapel Hill   (United States)

^b North Carolina State University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 5544285005     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.588708     Document Type: Article

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