Thermal expansion coefficients of low-k dielectric films from Fourier analysis of x-ray reflectivity

Journal of Applied Physics

Volumn 88, Issue 2, 2000, Pages 691-695

  Bouldin, C E ^a   Wallace, W E ^a   Lynn, G W ^a,b   Roth, S C ^a   Wu, W L ^a  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b UNIVERSITY OF TENNESSEE   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000255293     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.373722     Document Type: Article

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