Deposition of thin films of gallium sulfide from a novel single-source precursor, Ga(S2CNMeHex)3, by low-pressure metal-organic chemical vapor deposition

Chemistry of Materials

Volumn 11, Issue 12, 1999, Pages 3430-3432

  Lazell, Mike R ^a   O'Brien, Paul ^a   Otway, David J ^a   Park, Jin Ho ^a  

^a IMPERIAL COLLEGE LONDON   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000181088     PISSN: 08974756     EISSN: None     Source Type: Journal    
DOI: 10.1021/cm9905040     Document Type: Article

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