Microstructure-dependent ferroelectric properties of SrBi2Ta2O9 thin films fabricated by radio frequency magnetron sputtering

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 16, Issue 3, 1998, Pages 1258-1261

  Cho, Kwang Jun ^a,b   Lee, Jeon Kook ^a   Jung, Hyung Jin ^a   Park, Jong Wan ^b  

^a Korea Institute of Science and Technology   (South Korea)

^b Hanyang University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000172886     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.581270     Document Type: Article

References (12)

1. J. F. Scott and C. A. Araujo, Science 246, 1400 (1989).
2. C. A. Araujo, J. D. Cuchiaro, L. D. McMillan, M. C. Scott, and J. F. Scott, Nature (London) 374, 627 (1995).
3. R. Dat, J.-K. Lee, O. Auciello, and A. I. Kingon, Appl. Phys. Lett. 67, 572 (1995).
4. P. C. Joshi, S. O. Ryu, X. Zhang, and S. B. Desu, Appl. Phys. Lett. 70, 1080 (1997).
5. T. K. Song, J.-K. Lee, and H.-J. Jung, Appl. Phys. Lett. 69, 3839 (1996).
6. E. Kay, F. Parmigiani, and W. Parrish, J. Vac. Sci. Technol. A 6, 3074 (1988).
7. G. M. Turner, I. S. Falconer, B. W. James, and D. R. McKenzie, J. Appl. Phys. 65, 3671 (1989).
8. W. D. Westwood, J. Vac. Sci. Technol. 15, 1 (1978).
9. M. A. Rodriguez, T. J. Boyle, B. A. Hernandez, C. D. Buchheit, and M. O. Eatough, J. Mater. Res. 11, 2282 (1996).
10. I. Koiwa, Y. Okada, J. Mita, A. Hashimoto, and Y. Sawada, Jpn. J. Appl. Phys., Part 1 36, 5904 (1997).
11. H. J. Frost, C. V. Thompson, and D. T. Walton, Acta Metall. Mater. 40, 779 (1992).
12. D. Dimos, H. N. Al-Shareef, W. L. Warren, and B. A. Tuttle, J. Appl. Phys. 80, 1682 (1996).