Low degradation and fast annealing effects of amorphous silicon multilayer processed through alternate hydrogen dilution

Journal of Applied Physics

Volumn 88, Issue 8, 2000, Pages 4881-4888

  Jun, Kyung Hoon ^a   Ouwens, Jeroen Daey ^b   Schropp, Ruud E I ^b   Lee, Jeong Yong ^a   Choi, Jae Hyung ^a   Lee, Ho Seong ^a   Lim, Koeng Su ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

^b UTRECHT UNIVERSITY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000110764     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1311308     Document Type: Article

References (25)

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