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Volumn 76, Issue 6, 2000, Pages 697-699

Cross-sectional electron-beam-induced current analysis of the passivation of extended defects in cast multicrystalline silicon by remote hydrogen plasma treatment

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0000083799     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.125865     Document Type: Article
Times cited : (22)

References (13)
  • 5
    • 0347823090 scopus 로고    scopus 로고
    • E-MRS 1998 Spring Meeting, Symposium A: Defects in Silicon: Hydrogen
    • E-MRS 1998 Spring Meeting, Symposium A: Defects in Silicon: Hydrogen, edited by J. Weber and A. Mesli, Mater. Sci. Eng. B, 58 (1999).
    • (1999) Mater. Sci. Eng. B , pp. 58
    • Weber, J.1    Mesli, A.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.