Direct Imaging of Conducting and Insulating Submolecularly Wide Pathways in an Organic Semiconductor

Chemistry of Materials

Volumn 10, Issue 11, 1998, Pages 3275-3277

  Lovinger, Andrew J ^a   Katz, Howard E ^a   Dodabalapur, Ananth ^a  

^a LUCENT TECHNOLOGIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000059453     PISSN: 08974756     EISSN: None     Source Type: Journal    
DOI: 10.1021/cm980402u     Document Type: Article

References (26)

1. Fichou, D.; Horowitz, G.; Nishikitani, Y.; Roncali, J.; Garnier, F. Synth. Met. 1989, 28, C729.
2. Horowitz, G.; Fichou, D.; Peng, X. Z.; Garnier, F. Synth. Met. 1991, 41, 1127.
3. Akimichi, H.; Waragai, K.; Hotta, S.; Kano, H.; Sakaki, H. Appl. Phys. Lett. 1991, 58, 1500.
4. Katz, H. E.; Torsi, L.; Dodabalapur, A. Chem. Mater. 1995, 7, 2235.
5. Katz, H. E.; Dodabalapur, A.; Torsi, L.; Elder, D. Chem. Mater. 1995, 7, 2238.
6. Bao, Z.; Lovinger, A. J.; Brown, J. J. Am. Chem. Soc. 1998, 120, 207.
7. Bao, Z.; Lovinger, A. J.; Dodabalapur, A. Appl. Phys. Lett. 1996, 69, 3066.
8. Laquindanum, J. G.; Lovinger, A. J.; Dodabalapur, A.; Katz, H. E. Chem. Mater. 1996, 8, 2542.
9. Gundlach, D. J.; Lin, Y. Y.; Jackson, T. N. IEEE Electron. Device 1997, 18, 87.
10. Dimitrakopoulos, C. D.; Brown, A. R.; Pomp, A. J. J. Appl. Phys. 1996, 80, 2501.
11. Tsumura, A.; Koezuka,; Ando, T. Appl. Phys. Lett. 1986, 49, 1210.
12. Bao, Z.; Lovinger, A. J.; Dodabalapur, A. Appl. Phys. Lett. 1996, 69, 4108.
13. Laquindanum, J. G.; Katz, H. E.; Lovinger, A. J. J. Am. Chem. Soc. 1998, 120, 664.
14. Gamier, F.; Yassar, A.; Hajlaoui, R.; Horowitz, G.; Deloffre, F.; Servet, B.; Ries, S.; Alnot, P. J. Am. Chem. Soc. 1993, 115, 8716.
15. Katz, H. E.; Laquindanum, J. G.; Lovinger, A. J. Chem. Mater. 1998, 10, 633.
16. Lovinger, A. J.; Davis, D. D.; Dodabalapur, A.; Katz, H. E. Chem. Mater. 1996, 8, 2836.
17. Lovinger, A. J.; Davis, D. D.; Dodabalapur, A.; Katz, H. E.; Torsi, L. Macromolecules 1996, 29, 4952.
18. The different morphologies obtained for DHα6T in different studies may reflect highly sensitive dependence of crystal nucleation, growth, and orientation on details of the deposition process, e.g. subtle variations in deposition rate, source temperature, source-to-substrate distance, and vacuum.
19. Liao, J.; Martin, D. C. Science 1993, 260, 1489.
20. Ojeda, J. R.; Martin, D. C. Macromolecules 1993, 26, 6557.
21. Voigt-Martin, I. G.; Simon, P.; Bauer, S.; Ringsdorf, H. Macromolecules 1995, 28, 236.
22. Porzio, W.; Destri, S.; Mascherpa, M.; Bruckner, S. Acta Polym. 1993, 44, 266.
23. Horowitz, G.; Bachet, B.; Yassar, A.; Lang, P.; Demanze, F.; Fave, J.-L.; Garnier, F. Chem. Mater. 1993, 7, 1337.
24. Cerius molecular-modeling package, Molecular Simulations, Inc.
25. Pradere, P.; Thomas, E. L. Macromolecules 1990, 23, 4954.
26. Hotta, S.; Waragai, K. J. Mater. Chem. 1991, 1, 835.