Aberrations and allowances for errors in a hemisphere solid immersion lens for submicron-resolution photoluminescence microscopy

Journal of Applied Physics

Volumn 85, Issue 9, 1999, Pages 6923-6925

  Baba, Motoyoshi ^a   Sasaki, Takeaki ^a   Yoshita, Masahiro ^a   Akiyama, Hidefumi ^a  

^a UNIVERSITY OF TOKYO   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000027002     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.370107     Document Type: Article

References (12)

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