Ti-Al-Si-N nanocrystalline composite films synthesized by reactive magnetron sputtering

Materials Letters

Volumn 59, Issue 2-3, 2005, Pages 171-174

  Dong, Yunshan ^a   Mei, Fanghua ^a   Hu, Xiaoping ^a   Li, Geyang ^a   Gu, Mingyuan ^a  

^a SHANGHAI JIAO TONG UNIVERSITY   (China)

Author keywords

Mechanical properties; Microstructure; Reactive magnetron sputtering; Ti Al Si N nanoctystalline composite film; Tisix interface phase

Indexed keywords

ELASTIC MODULI; ENERGY DISPERSIVE SPECTROSCOPY; MAGNETRON SPUTTERING; MICROSTRUCTURE; NANOSTRUCTURED MATERIALS; SYNTHESIS (CHEMICAL); TERNARY SYSTEMS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

NANOINDENTER; REACTIVE MAGNETRON SPUTTERING; TI-AL-SI-N NANOCRYSTALLINE COMPOSITE FILMS; TISIX INTERFACE PHASE;

COMPOSITE MATERIALS;

EID: 9644295660     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matlet.2004.09.008     Document Type: Article

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