Effect of plasma conditions on fabrication of multi-walled carbon nanotubes grown perpendicularly on Hastelloy C276®

Diamond and Related Materials

Volumn 14, Issue 1, 2005, Pages 11-15

  Shimizu, Yoshiki ^a   Sasaki, Takeshi ^a   Kodaira, Tetsuya ^a   Kawaguchi, Kenji ^a   Terashima, Kazuo ^b   Koshizaki, Naoto ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b UNIVERSITY OF TOKYO   (Japan)

Author keywords

Carbon nanotube; Film; Hastelloy C 276; Plasma

Indexed keywords

CATALYST ACTIVITY; CHEMICAL VAPOR DEPOSITION; CURRENT DENSITY; FILM GROWTH; FILMS; NUCLEATION; PLASMAS; PRECIPITATION (CHEMICAL);

CATALYTIC GROWTH; DIRECT CURRENT (DC); HASTEALLOY C-276; NUCLEUS FORMATION;

CARBON NANOTUBES;

EID: 9644283199     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2004.06.038     Document Type: Article

References (19)

1. A. Dai, A.W.H. Mau, Adv. Mater. 13 (2001) 899.
2. R. Vajtai, B.Q. Wei, Z.J. Zhang, Y. Jung, G. Ramanath, P.M. Ajayan, Smart Mater. Struct. 11 (2002) 691.
3. C.N.R. Rao, A. Govindaraj, Acc. Chem. Res. 35 (2002) 998.
4. R. Andrews, D. Jacques, D. Qian, T. Rantell, Acc. Chem. Res. 35 (2002) 1008.
5. H. Dai, Acc. Chem. Res. 35 (2002) 1035.
6. K. Matthews, B.A. Cruden, B. Chen, M. Meyyappan, L. Delzeit, J. Nanosci. Nanotechnol. 2 (2002) 475.
7. Y. Chen, Z.L. Wang, J.S. Yin, D.J. Johnson, R.H. Prince, Chem. Phys. Lett. 272 (1997) 178.
8. Z.F. Ren, Z.P. Huang, J.W. Xu, J.H. Wang, P. Bush, M.P. Siegel, P.N. Provencio, Science 282 (1998) 1105.
9. M. Jung, K.Y. Eun, Y.J. Baik, K.R. Lee, J.K. Shin, S.T. Kim, Thin Solid Films 398-399 (2001) 150.
10. J.B. Park, G.S. Choi, Y.S. Cho, S.Y. Hong, D. Kim, S.Y. Choi, J.H. Lee, K.I. Cho, J. Cryst. Growth 244 (2002) 211.
11. M. Jung, K.Y. Eun, J.K. Lee, Y.J. Baik, K.R. Lee, J.W. Park, Dia. Relat. Mat. 10 (2001) 1235.
12. M. Okai, T. Muneyoshi, T. Yaguchi, S. Sasaki, Appl. Phys. Lett. 77 (2000) 3468.
13. Y. Chan, D.T. Shaw, X.B. Bai, E.G. Wang, C. Lund, W.M. Lu, D.D.L. Chung, Appl. Phys. Lett. 78 (2001) 2128.
14. M. Chhowalla, K.B.K. Teo, C. Ducati, N.L. Rupesinghe, G.A.J. Amaratunga, A.C. Ferrari, D. Roy, J. Robertson, W.I. Milne, J. Appl. Phys. 90 (2001) 5308.
15. L.B.K. Teo, M. Chhowalla, G.A.J. Amaratunga, W.I. Milne, D.G. Hasko, G. Pirio, P. Legagneux, F. Wyczisk, D. Probat, Appl. Phys. Lett. 79 (2001) 1534.
16. Q. Yang, C. Xiao, W. Chen, A.K. Singh, T. Asai, A. Hirose, Dia. Relat. Mat. 12 (2003) 1482.
17. Y.Y. Wei, G. Eres, V.I. Merkoulov, D.H. Lowndes, Appl. Phys. Lett. 78 (2001) 1394.
18. C.L. Cheung, A. Kurtz, H. Park, C.M. Lieber, J. Phys. Chem., B 106 (2002) 2429.
19. X.X. Zhang, Z.Q. Li, G.H. Wen, K.K. Fung, J. Chen, Y. Li, Chem. Phys. Lett. 333 (2001) 509.