Time dependent diffusion coefficient of water into silica glass at low temperatures

Materials Science and Engineering: A

Volumn 272, Issue 1, 1999, Pages 114-119

  Tomozawa, Minoru ^a   Davis, Kenneth M ^a  

^a RENSSELAER POLYTECHNIC INSTITUTE   (United States)

Author keywords

Silica glass; Stress; Structural relaxation; Water diffusion; Water solubility

Indexed keywords

FUSED SILICA; HYDROXYLATION; LOW TEMPERATURE EFFECTS; MATHEMATICAL MODELS; PHASE EQUILIBRIA; SOLUBILITY; STRESS RELAXATION; VAPOR PRESSURE; WATER;

GLASS WATER REACTION EQUILIBRIUM CONSTANT; STRUCTURAL RELAXATION; WATER SOLUBILITY;

DIFFUSION IN SOLIDS;

EID: 0039171309     PISSN: 09215093     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-5093(99)00463-3     Document Type: Article

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