Metal alloy and monoelemental nanoclusters in silica formed by sequential ion implantation and annealing in selected atmosphere

Physica B: Condensed Matter

Volumn 353, Issue 1-2, 2004, Pages 92-97

  Ren, F ^a   Jiang, C Z ^a   Chen, H B ^b   Shi, Y ^a   Liu, C ^a   Wang, J B ^a  

^a WUHAN UNIVERSITY   (China)

^b INSTITUTE OF SEMICONDUCTORS   (China)

Author keywords

Alloy; Annealing; Ion implantation; Nanocluster composites

Indexed keywords

ANNEALING; COMPOSITE MATERIALS; ELECTRON DIFFRACTION; ENERGY DISPERSIVE SPECTROSCOPY; GLASS; ION IMPLANTATION; LIGHT ABSORPTION; OXIDATION; REDUCTION; SILICA; SILVER ALLOYS; SPECTROMETERS;

ANNEALING TEMPERATURE; MONOELEMENTAL NANOCLUSTERS; NANOCLUSTER COMPOSITES;

NANOSTRUCTURED MATERIALS;

EID: 9544252172     PISSN: 09214526     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.physb.2004.09.005     Document Type: Article

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