Modification of the properties of silica glasses by ion implantation

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2998, Issue , 1997, Pages 122-131

  Brebner, John L ^a   Allard, Louis B ^a   Verhaegen, Marc ^a   Essid, Mourad ^a   Albert, Jacques ^b   Simpson, Peter ^c   Knights, Andrew P ^c  

^a UNIVERSITÉ DE MONTRÉAL   (Canada)

^b Industry Canada   (Canada)

^c UNIVERSITY OF WESTERN ONTARIO   (Canada)

Author keywords

Colour centers; Compaction; Ge doped silica; Ion implantation; Photosensitivity; Positron spectroscopy; Silica

Indexed keywords

COLOUR CENTERS; GE-DOPED SILICA; HIGH ENERGIES; KRF EXCIMER; PHYSICAL PROCESSES; POSITRON SPECTROSCOPY; PREPARATION CONDITIONS; SILICA GLASSES; UV IRRADIATIONS;

BLEACHING; CHEMICAL MODIFICATION; CLEANING; COMPACTION; GERMANIUM; ION BOMBARDMENT; ION IMPLANTATION; IONS; KRYPTON; LIGHT SENSITIVE MATERIALS; OPTICAL MATERIALS; OXIDES; PHOTOSENSITIVITY; POSITRON ANNIHILATION SPECTROSCOPY; POSITRONS; REFRACTIVE INDEX; SILICA;

FUSED SILICA;

EID: 9344238475     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.264173     Document Type: Conference Paper

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