Quantitative assessment of DNA damage accompanied with no substantial loss in its molecular weight during exposure to oxidative stress

Biochemical Engineering Journal

Volumn 22, Issue 1, 2004, Pages 81-87

  Kim, SunYoung ^a   Taguchi, Takao ^a   Nishioka, Motomu ^a   Taya, Masahito ^a,b  

^a Osaka U   (Japan)

^b OSAKA UNIVERSITY   (Japan)

Author keywords

DNA damage; Oxidative stress; Reactive oxygen species; TiO 2 photoreaction; Transformation efficiency

Indexed keywords

DNA DAMAGE; GEL ELECTROPHORESIS; OXIDATIVE STRESS; PHOTOREACTIONS;

BACTERIA; ELECTROPHORESIS; MOLECULAR STRUCTURE; MOLECULAR WEIGHT; OXIDATION; PHOTOCHEMICAL REACTIONS; STRESSES; TITANIUM DIOXIDE;

DNA;

DNA; REACTIVE OXYGEN METABOLITE;

AGAR GEL ELECTROPHORESIS; ARTICLE; DNA DAMAGE; LIGHT; MATHEMATICAL MODEL; MOLECULAR SIZE; MOLECULAR WEIGHT; OXIDATIVE STRESS; PHOTOREACTIVITY; PLASMID; PRIORITY JOURNAL; QUANTITATIVE ANALYSIS;

BACTERIA (MICROORGANISMS); ESCHERICHIA COLI;

EID: 9244256747     PISSN: 1369703X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.bej.2004.08.005     Document Type: Article

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