Identification of a self-limiting reaction layer in Ni-3 at.% W rolling-assisted biaxially textured substrates

Superconductor Science and Technology

Volumn 17, Issue 11, 2004, Pages 1295-1302

  Leonard, K J ^a   Goyal, A ^a   Kang, S ^a   Yarborough, K A ^a   Kroeger, D M ^a  

^a OAK RIDGE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CRITICAL CURRENTS; ELECTRON DIFFRACTION; ROLLING; SUBSTRATES; SUPERCONDUCTING MATERIALS; TEXTURES;

BUFFER-SUBSTRATE INTERFACES; METAL OXIDE BUFFERS; SELF-LIMITING REACTIONS;

NICKEL;

EID: 9244237604     PISSN: 09532048     EISSN: None     Source Type: Journal    
DOI: 10.1088/0953-2048/17/11/010     Document Type: Article

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