Wide-range tuning of polymer microring resonators by the photobleaching of CLD-1 chromophores

Optics Letters

Volumn 29, Issue 22, 2004, Pages 2584-2586

  Poon, Joyce K S ^a   Huang, Yanyi ^a   Paloczi, George T ^a   Yariv, Amnon ^a   Zhang, Cheng ^b   Dalton, Larry R ^c  

^a California Institute of Technology   (United States)

^b Pacific Wave Industries Inc   (United States)

^c UNIVERSITY OF WASHINGTON   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

PHOTOBLEACH TRIMMING; POLYMER MICRORING RESONATORS; THERMO-OPTIC TUNING;

BLEACHING; CHROMOPHORES; NOTCH FILTERS; POLYMERS; RESONANCE; TUNING;

OPTICAL DEVICES;

EID: 9144264937     PISSN: 01469592     EISSN: None     Source Type: Journal    
DOI: 10.1364/OL.29.002584     Document Type: Article

References (22)

1. J. Haavisto and G. A. Pajer, Opt. Lett. 5, 510 (1980).
2. D. G. Rabus, M. Hamacher, U. Troppenz, and H. Heidrich, IEEE Photon. Technol. Lett. 14, 1442 (2002).
3. P. Rabiei, W. H. Steier, C. Zhang, and L. R. Dalton, J. Lightwave Technol. 20, 1968 (2002).
4. P. P. Absil, S. T. Chu, D. Gill, J. V. Hryniewicz, F. Johnson, O. King, B. E. Little, F. Seiferth, and V. Van, in Optical Fiber Communication Conference on CD-ROM, Postconference Digest, Vol. 95 of OSA Trends in Optics and Photonics Series (Optical Society of America, Washington, D.C., 2004), p. TuL3.
5. S. J. Choi, K. Djordjev, S. J. Choi, P. D. Dapkus, W. Lin, G. Griffel, R. Menna, and J. Connolly, IEEE Photon. Technol. Lett. 16, 828 (2004).
6. M.-C. Oh, H. Zhang, C. Zhang, H. Erlig, Y. Chang, B. Tsap, D. Chang, A. Szep, W. H. Steier, H. R. Fetterman, and L. R. Dalton, IEEE J. Sci. Top. Quantum Electron. 7, 826 (2001).
7. H. Ma, A. K.-Y. Jen, and L. R. Dalton, Adv. Mater. 14, 1339 (2002).
8. P. Rabiei and W. H. Steier, IEEE Photon. Technol. Lett. 15, 1255 (2003).
9. S. T. Chu, W. Pan, S. Sato, T. Kaneko, B. E. Little, and Y. Kokubun, IEEE Photon. Technol. Lett. 11, 688 (1999).
10. S. Suzuki, Y. Hatakeyama, Y. Kokubun, and S. T. Chu, J. Lightwave Technol. 20, 745 (2002).
11. Y. N. Xia and G. M. Whitesides, Annu. Rev. Mater. Sci. 28, 153 (1998).
12. Y. Huang, G. T. Paloczi, J. Scheuer, and A. Yariv, Opt. Express 11, 2452 (2003), http://www.opticsexpress.org.
13. G. T. Paloczi, Y. Huang, A. Yariv, J. Luo, and A. K.-Y. Jen, Appl. Phys. Lett. 85, 1662 (2004).
14. C. Zhang, L. R. Dalton, M.-C. Oh, H. Zhang, and W. H. Steier, Chem. Mater. 13, 3043 (2001).
15. A. T. Chen, V. Chuyanov, F. I. MartiCarrera, S. Garner, W. H. Steier, S. S. H. Mao, Y. S. Ra, L. R. Dalton, and Y. Q. Shi, IEEE Photon. Technol. Lett. 9, 1499 (1997).
16. M. B. J. Diemeer, F. M. M. Suyten, E. S. Trommel, A. McDonach, J. M. Copeland, L. W. Jenneskens, and W. H. G. Horstuis, Electron. Lett. 26, 379 (1990).
17. S. K. Kim, K. Greary, H. R. Fetterman, C. Zhang, C. Wang, and W. H. Steier, Electron. Lett. 39, 1321 (2003).
18. A. Yariv, Electron. Lett. 36, 321 (2000).
19. J. C. Slater, Microwave Electronics (Van Nostrand, New York, 1950).
20. O. Schwelb, J. Lightwave Technol. 22, 1380 (2004).
21. A. Galvan-Gonzalez, M. Canva, G. I. Stegeman, R. Twieg, K. P. Chan, T. C. Kowalczyk, X. Q. Zhang, H. S. Lackritz, S. Marder, and S. Thayumanavan, Opt. Lett. 25, 332 (2000).
22. C. C. Teng, Appl. Phys. Lett. 60, 1538 (1992).