Model-based control of rapid thermal processing for semiconductor wafers

Proceedings of the American Control Conference

Volumn 5, Issue , 2004, Pages 3910-3921

  Ebert, J L ^a   De Roover, D ^a   Porter II, L L ^a   Lisiewicz, V A ^a   Ghosal, S ^a   Kosut, R L ^a   Emami Naeini, A ^a  

^a SC Solutions Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

PRINCIPAL ORTHOGONAL DECOMPOSITION (POD); RAPID THERMAL PROCESSING (RTP); SEMICONDUCTOR WAFERS;

CONTROL EQUIPMENT; CONTROL SYSTEMS; COOLING; HEAT TRANSFER; SILICON WAFERS; TEMPERATURE CONTROL;

SEMICONDUCTOR MATERIALS;

EID: 8744305890     PISSN: 07431619     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ACC.2004.182562     Document Type: Conference Paper

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