At-wavelength and optical metrology of bendable X-ray optics for nanofocusing at the ALS

Optics InfoBase Conference Papers

Volumn , Issue , 2009, Pages

  Yuan, Sheng ^a   Goldberg, Kenneth ^a   Yashchuk, Valeriy V ^a   Celestre, Richard ^a   Warwick, Tony ^a   McKinney, Wayne R ^a   Morrison, Gregory ^a   Rekawa, Senajith B ^a   Mochi, Iacopo ^a   Padmore, Howard A ^a  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

LIGHT SOURCES;

ADVANCED LIGHT SOURCE; HIGH QUALITY; MICRORADIAN PRECISION; NANO-FOCUSING; OPTICAL METROLOGY; OPTICAL METROLOGY TECHNIQUES; RESEARCH AND DEVELOPMENT PROGRAMS; SURFACE PROFILES;

X RAY OPTICS;

EID: 85087598722     PISSN: None     EISSN: 21622701     Source Type: Conference Proceeding    
DOI: 10.1364/fio.2009.ftht2     Document Type: Conference Paper

References (3)

1. K. A. Goldberg, P. Naulleau, et al. Proc. SPIE 5900, 114 (2005).
2. W. R. McKinney, S. C. Irick, J. L. Kirschman, A. A. MacDowell, A. Warwick, V. V. Yashchuk, Proc. of SPIE 6704, 67040G, (2007), submitted to J. Opt. Eng.
3. A. Seifert, AIP Conf. Proc. 879, 459 (2007).