A study of the influence of typical wet chemical treatments on the germanium wafer surface

Solid State Phenomena

Volumn 103-104, Issue , 2005, Pages 27-30

  Onsia, B ^a,b   Conard, T ^a   De Gendt, S ^a,b   Heyns, M ^a   Hoflijk, I ^a   Mertens, P ^a   Meuris, M ^a   Raskin, G ^c   Sioncke, S ^a   Teerlinck, I ^a   Theuwis, A ^c   Van Steenbergen, J ^a   Vinckier, C ^b  

^a IMEC   (Belgium)

^b UNIVERSITY OF LEUVEN   (Belgium)

^c UMICORE   (Belgium)

Author keywords

Etching; Germanium; Oxidation; Rinsing; Stability

Indexed keywords

ETCHING; OXIDATION; SOLUBILITY; SOLUTIONS; SURFACE CHEMISTRY;

RINSING; WAFER SURFACE;

GERMANIUM COMPOUNDS;

EID: 85087579037     PISSN: 10120394     EISSN: None     Source Type: Book Series    
DOI: 10.4028/3-908451-06-x.27     Document Type: Conference Paper

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6. to be published.
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