Dynamics and mechanism of discrete etching of organic materials by femtosecond laser excitation

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4274, Issue , 2001, Pages 78-87

  Hosokawa, Yoichiroh ^a   Yashiro, Masaki ^a   Asahi, Tsuyoshi ^a   Masuhara, Hiroshi ^a  

^a OSAKA UNIVERSITY   (Japan)

Author keywords

Discrete etching; Femtosecond laser ablation; Phthalocyanine film; Time resolved imaging; Time resolved spectroscopy

Indexed keywords

ABLATION; ABSORPTION SPECTROSCOPY; ETCHING; FEMTOSECOND LASERS; LASER ABLATION; LASER SPECTROSCOPY; MICROELECTRONICS; MORPHOLOGY; ORGANIC LASERS; SAPPHIRE; SURFACE MORPHOLOGY; SURFACE SCATTERING; THIN FILMS;

ABLATION THRESHOLDS; MECHANICAL DISRUPTION; ORGANIC MATERIALS; PHTHALOCYANINE FILMS; TI: SAPPHIRE LASER; TIME RESOLVED IMAGING; TIME-RESOLVED ABSORPTION; TIME-RESOLVED SPECTROSCOPY;

LASER EXCITATION;

EID: 85076790798     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.432499     Document Type: Conference Paper

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