Vanadium Pentoxide Thin Films by XPS

Surface Science Spectra

Volumn 6, Issue 3, 1999, Pages 168-176

  Barreca, Davide ^a   Rizzi, Gian Andrea ^a   Tondello, Eugenio ^a  

^a UNIVERSITY OF PADOVA   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; ALUMINUM OXIDE; GLASS; PLASMA CVD; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; THIN FILMS; VANADIUM PENTOXIDE; X RAY PHOTOELECTRON SPECTROSCOPY;

CHEMICAL VAPOUR DEPOSITION; GLASS SUBSTRATES; MEASUREMENTS OF; NANO-STRUCTURED; POLYCRYSTALLINE; PREFERENTIAL ORIENTATION; SPECTROSCOPY MEASUREMENTS; VANADIUM PENTOXIDE THIN FILMS;

SUBSTRATES;

EID: 85070145745     PISSN: 10555269     EISSN: 15208575     Source Type: Journal    
DOI: 10.1116/1.1247919     Document Type: Article

References (2)

1. D.Barreca, L. E.Depero, E.Franzato, G. A.Rizzi, L.Sangaletti, E.Tondello, and U.Vettori, J. Electrochem. Soc. 146, 551 (1999). 10.1149/1.1391642
2. J.Mendialdua, R.Casanova, and Y.Barbaux, J. Electron. Spectrosc. Relat. Phenom. 71, 249 (1995). 10.1016/0368-2048(94)02291-7