Age-based double EWMA controller and its application to a CMP process

Run-to-Run Control in Semiconductor Manufacturing

Volumn , Issue , 2000, Pages 261-276

  Chen, Argon ^a   Guo, Ruey Shan ^b  

^a NATIONAL TAIWAN UNIVERSITY   (Taiwan)

^b NATIONAL TAIWAN UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 85056912945     PISSN: None     EISSN: None     Source Type: Book    
DOI: None     Document Type: Chapter

References (9)

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2. Bulter, S. and Stefani, J., “Supervisory Run-to-Run Control of Polysilicon Gate Etch Using In Situ Ellipsometry,” IEEE Transactions Semiconductor Manufacturing, vol. 7, no. 2, May 1994.
3. Smith, T., Boning, D., Stefani, J., and Butler, S., “Run by Run Advanced Process Control of Metal Sputter Deposition,” IEEE Transactions on Semiconductor Manufacturing, vol. 11, no. 2, May 1998.
4. Box, G. and Jenkins, M., Time Series Analysis -Forecasting and Control, Oakland, CA: Holden-Day, 1974.
5. Boning, D., Moyne, W., Smith, T., Moyne, J., Telfeyan, R., Hurwitz, A., Shellman, S., and Taylor, J., “Run by Run Control of Chemical-Mechanical Polishing,” IEEE Transactions on Components, Packaging, and Manufacturing Technology -Part C, vol. 19, no. 4, October 1996.
6. Smith, T. and Boning, D., “A Self-Tuning EWMA Controller Utilizing Artificial Neural Network Function Approximation Techniques,” IEEE Transactions on Components, Packaging, and Manufacturing Technology, March 1997.
7. Castillo, E.D. and Hurwitz, A., “Run-to-Run Process Control: Literature Review and Extensions.” Journal of Quality Technology, vol. 29, no. 2, April 1997.
8. Chiou, H.W. and Chen, L.J., “PID Run to Run Control of CMP Removal Rate,” Proc. CMP-MIC Conference, pp. 375-382, 1997.
9. Ning, Z., Moyne, J., Smith, T., Boning, D., Castillo, E.D., Yeh, J., and Hurwitz, A., “A Comparative Analysis of Run-to-Run Control Algorithms in the Semiconductor Manufacturing Industry,” Advanced Semiconductor Manufacturing Conference, Cambridge, MA, 1996.