Critical role and modification of surface states in hematite films for enhancing oxygen evolution activity

Journal of Materials Research

Volumn 33, Issue 4, 2018, Pages 455-466

  Pyeon, Myeongwhun ^a   Ruoko, Tero Petri ^b   Leduc, Jennifer ^a   Gönüllü, Yakup ^a   Deo, Meenal ^a   Tkachenko, Nikolai V ^b   Mathur, Sanjay ^a  

^a UNIVERSITY OF COLOGNE   (Germany)

^b TAMPERE UNIVERSITY OF TECHNOLOGY   (Finland)

Author keywords

plasma enhanced CVD (PECVD) (deposition); surface chemistry; thin film

Indexed keywords

ABSORPTION SPECTROSCOPY; ANNEALING; BINDING ENERGY; CHEMICAL VAPOR DEPOSITION; DEPOSITION; ELECTRIC LAMPS; ELECTROCHEMISTRY; HEMATITE; OXYGEN; OXYGEN VACANCIES; PARTICLE SIZE; PHOTOCURRENTS; PLASMA APPLICATIONS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SURFACE CHEMISTRY; SURFACE DEFECTS; SURFACE STATES; THIN FILMS; VAPOR DEPOSITION; X RAY PHOTOELECTRON SPECTROSCOPY;

OXYGEN EVOLUTION ACTIVITY; OXYGEN PLASMA TREATMENTS; PHOTOELECTROCHEMICAL PROPERTIES; PHOTOELECTROCHEMICALS; PLASMAENHANCED CVD (PECVD); REACTIVE OXYGEN SPECIES; RECOMBINATION CENTERS; TRANSIENT ABSORPTION SPECTROSCOPIES;

PLASMA CVD;

EID: 85041350497     PISSN: 08842914     EISSN: 20445326     Source Type: Journal    
DOI: 10.1557/jmr.2017.465     Document Type: Article

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