Interfacial insight in multi-junction metal oxide photoanodes for water-splitting applications

Nano Energy

Volumn 19, Issue , 2016, Pages 415-427

  Mettenborger A ^a   Gonullu Y ^a   Fischer, T ^a   Heisig, T ^a   Sasinska, A ^a   Maccato, C ^b   Carraro, G ^b   Sada, C ^b   Barreca, D ^b   Mayrhofer, L ^c   Moseler, M ^c   Held, A ^c   Mathur, S ^a,d  

^a UNIVERSITY OF COLOGNE   (Germany)

^b UNIVERSITY OF PADOVA   (Italy)

^c FRAUNHOFER INSTITUTE FOR MECHANICS OF MATERIALS IWM   (Germany)

^d XI'AN JIAOTONG UNIVERSITY   (China)

Author keywords

Ab initio; Fe2O3; Multi junction; TiO2; Water splitting

Indexed keywords

ATOMIC LAYER DEPOSITION; CALCULATIONS; CHARGE TRANSFER; CHEMICAL VAPOR DEPOSITION; DEPOSITION; ELECTRIC FIELDS; ELECTRONIC PROPERTIES; ELECTRONIC STRUCTURE; FILM GROWTH; GRAIN GROWTH; HEMATITE; INTERFACES (MATERIALS); MASS SPECTROMETRY; METALS; OXIDE FILMS; PHOTOCURRENTS; PHOTOELECTROCHEMICAL CELLS; PLASMA CVD; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SECONDARY ION MASS SPECTROMETRY; SEMICONDUCTOR DOPING; THIN FILMS; TITANIUM DIOXIDE; VAPOR DEPOSITION; X RAY PHOTOELECTRON SPECTROSCOPY;

AB INITIO; FILM/SUBSTRATE INTERFACE; MULTI-JUNCTIONS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITIONS (PE CVD); SECONDARY ION MASS SPECTROSCOPIES (SIMS); SURFACE-LIQUID INTERFACES; TIO; WATER SPLITTING;

TIN;

EID: 84951111103     PISSN: 22112855     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nanoen.2015.09.018     Document Type: Article

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