|
Volumn 85, Issue 22, 2000, Pages 4835-
|
Comment on “self-diffusion in silicon: Similarity between the properties of native point defects”
|
Author keywords
[No Author keywords available]
|
Indexed keywords
|
EID: 85019404700
PISSN: 00319007
EISSN: 10797114
Source Type: Journal
DOI: 10.1103/PhysRevLett.85.4835 Document Type: Article |
Times cited : (15)
|
References (3)
|