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Volumn 85, Issue 22, 2000, Pages 4835-

Comment on “self-diffusion in silicon: Similarity between the properties of native point defects”

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EID: 85019404700     PISSN: 00319007     EISSN: 10797114     Source Type: Journal    
DOI: 10.1103/PhysRevLett.85.4835     Document Type: Article
Times cited : (15)

References (3)
  • 2
    • 0000543030 scopus 로고
    • references therein
    • H. Bracht; Phys. Rev. B 52, 16 542 (1995), and references therein.
    • (1995) Phys. Rev. B , vol.52 , Issue.16 , pp. 542
    • Bracht, H.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.