Influence of Interface Roughness on Silicon Oxide Thickness Measured by Ellipsometry

Journal of the Electrochemical Society

Volumn 145, Issue 1, 1998, Pages 371-372

  Fans, S J ^a   Chen, W ^a   Yamanaka, T ^a   Helms, C R ^a  

^a RENSSELAER POLYTECHNIC INSTITUTE   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 85016916989     PISSN: 00134651     EISSN: 19457111     Source Type: Journal    
DOI: None     Document Type: Article

References (3)

1. A. H. Cain and R. Sinclair, This Journal, 134, 741 (1987).
2. S. C. Kao and R. H. Doremus, This Journal, 141, 1832 (1994).
3. S. Iwata and A. Ishizaka, J. Appl. Phys., 79, 6653 (1996).