What Limits the Performance of Ta3N5 for Solar Water Splitting?

Chem

Volumn 1, Issue 4, 2016, Pages 640-655

  He, Yumin ^a   Thorne, James E ^a   Wu, Cheng Hao ^b   Ma, Peiyan ^a,c   Du, Chun ^a   Dong, Qi ^a   Guo, Jinghua ^b   Wang, Dunwei ^a  

^a BOSTON COLLEGE   (United States)

^b LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^c WUHAN UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

atomic layer deposition; electrochemistry; Fermi level pinning; nitride; passivation; photovoltage; stability; water splitting; X ray spectroscopy

Indexed keywords

EID: 85008256271     PISSN: 24519294     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.chempr.2016.09.006     Document Type: Article

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