Realistic copper interconnect performance with technological constraints

Proceedings of the IEEE 2001 International Interconnect Technology Conference, IITC 2001

Volumn , Issue , 2001, Pages 233-235

  Kapur, P ^a   McVittie, J P ^a   Saraswat, K C ^a  

^a Stanford University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 85001137468     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/IITC.2001.930070     Document Type: Conference Paper

References (5)

1. The International Technology Roadmap for Semiconductors (ITRS), 1999.
2. P. Kapur, J.P. McVittie and K.C. Saraswat, to be published.
3. K. Fuchs, Proc. Camb. Phil. Soc., vol. 34, 1938, pp. 100
4. E.H. Sondheimer, Advan. Phys., vol. 1, 1952, pp.1
5. F. Chen and D. Gardner, IEEE Electron Device Letters, vol. 19, no. 12, 1998, pp. 508-510