Oxygen vacancy-driven evolution of structural and electrical properties in SrFeO3-δ thin films and a method of stabilization

Applied Physics Letters

Volumn 109, Issue 14, 2016, Pages

  Enriquez, Erik ^a   Chen, Aiping ^a   Harrell, Zach ^a,b   Lü, Xujie ^a   Dowden, Paul ^a   Koskelo, Nicholas ^a   Janoschek, Marc ^a   Chen, Chonglin ^b   Jia, Quanxi ^a,c  

^a LOS ALAMOS NATIONAL LABORATORY   (United States)

^b UNIVERSITY OF TEXAS AT SAN ANTONIO   (United States)

^c The State University of New York   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; ALUMINUM OXIDE; AMORPHOUS FILMS; CRYSTAL STRUCTURE; EPITAXIAL GROWTH; IRON COMPOUNDS; OXIDE FILMS; PASSIVATION; PULSED LASER DEPOSITION; STRONTIUM COMPOUNDS; STRUCTURAL PROPERTIES; THIN FILMS; VACANCIES;

ELECTRICAL CONDUCTIVITY; INITIAL RESISTIVITY; OUT-OF-PLANE LATTICE PARAMETERS; RESISTIVITY CHANGES; SAMPLE ENVIRONMENT; STRUCTURAL AND ELECTRICAL PROPERTIES; THIN FILM MATERIAL; TIME-DEPENDENT STRUCTURE;

OXYGEN VACANCIES;

EID: 84990841968     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4964384     Document Type: Article

References (22)

1. J. P. Hodges, S. Short, J. D. Jorgensen, X. Xiong, B. Dabrowski, S. M. Mini, and C. W. Kimball, J. Solid State Chem. 151 (2), 190 (2000). 10.1006/jssc.1999.8640
2. Y. D. Wang, J. B. Chen, and X. H. Wu, Mater. Lett. 49 (6), 361 (2001). 10.1016/S0167-577X(00)00400-6
3. A. Nemudry, P. Weiss, I. Gainutdinov, V. Boldyrev, and R. Schollhorn, Chem. Mater. 10 (9), 2403 (1998). 10.1021/cm980090v
4. H. Falcon, J. A. Barbero, J. A. Alonso, M. J. Martinez-Lope, and J. L. G. Fierro, Chem. Mater. 14 (5), 2325 (2002). 10.1021/cm011292l
5. I. Starkov, S. Bychkov, A. Matvienko, and A. Nemudry, Phys. Chem. Chem. Phys. 16 (12), 5527 (2014). 10.1039/C3CP52143E
6. A. Lebon, P. Adler, C. Bernhard, A. V. Boris, A. V. Pimenov, A. Maljuk, C. T. Lin, C. Ulrich, and B. Keimer, Phys. Rev. Lett. 92 (3), 037202 (2004). 10.1103/PhysRevLett.92.037202
7. T. Takeda, Y. Yamaguch, and H. Watanabe, J. Phys. Soc. Jpn. 33 (4), 967 (1972). 10.1143/JPSJ.33.967
8. Y. Tsujimoto, C. Tassel, N. Hayashi, T. Watanabe, H. Kageyama, K. Yoshimura, M. Takano, M. Ceretti, C. Ritter, and W. Paulus, Nature 450 (7172), 1062 (2007). 10.1038/nature06382
9. B. C. Tofield, C. Greaves, and B. E. F. Fender, Mater. Res. Bull. 10 (7), 737 (1975). 10.1016/0025-5408(75)90059-8
10. P. Adler, A. Lebon, V. Damljanovic, C. Ulrich, C. Bernhard, A. V. Boris, A. Maljuk, C. T. Lin, and B. Keimer, Phys. Rev. B 73 (9), 094451 (2006). 10.1103/PhysRevB.73.094451
11. S. Chakraverty, T. Matsuda, H. Wadati, J. Okamoto, Y. Yamasaki, H. Nakao, Y. Murakami, S. Ishiwata, M. Kawasaki, Y. Taguchi, Y. Tokura, and H. Y. Hwang, Phys. Rev. B 88 (22), 220405 (2013). 10.1103/PhysRevB.88.220405
12. H. Oda, Y. Yamaguchi, H. Takei, and H. Watanabe, J. Phys. Soc. Jpn. 42 (1), 101 (1977). 10.1143/JPSJ.42.101
13. H. Yamada, M. Kawasaki, and Y. Tokura, Appl. Phys. Lett. 80 (4), 622 (2002). 10.1063/1.1445805
14. P. C. Dowden, Z. Bi, and Q. X. Jia, Rev. Sci. Instrum. 85 (2), 025111 (2014). 10.1063/1.4865716
15. P. C. Dowden and Q. X. Jia, U.S. patent 9353435 (31 May 2016).
16. A. P. Chen, J. M. Hu, P. Lu, T. Yang, W. Zhang, L. G. Li, T. Ahmed, E. Enriquez, M. Weigand, Q. Su, H. Wang, J. X. Zhu, J. L. MacManus-Driscoll, L. Q. Chen, D. Yarotski, and Q. X. Jia, Sci. Adv. 2 (6), e1600245 (2016). 10.1126/sciadv.1600245
17. Y. Takeda, K. Kanno, T. Takada, O. Yamamoto, M. Takano, N. Nakayama, and Y. Bando, J. Solid State Chem. 63 (2), 237 (1986). 10.1016/0022-4596(86)90174-X
18. P. K. Gallagher, D. N. Buchanan, and J. B. Macchesney, J. Chem. Phys. 41 (8), 2429 (1964). 10.1063/1.1726282
19. A. P. Chen, F. Khatkhatay, W. Zhang, C. Jacob, L. Jiao, and H. Wang, J. Appl. Phys. 114 (12), 124101 (2013). 10.1063/1.4821643
20. P. Benzi, E. Bottizzo, and N. Rizzi, J. Cryst. Growth 269 (2-4), 625 (2004). 10.1016/j.jcrysgro.2004.05.082
21. X. Z. Liu, B. W. Tao, and Y. R. Li, J. Mater. Sci. 42 (1), 389 (2007). 10.1007/s10853-006-1088-2
22. H. Jeen, W. S. Choi, J. W. Freeland, H. Ohta, C. U. Jung, and H. N. Lee, Adv. Mater. 25 (27), 3651 (2013). 10.1002/adma.201300531