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9th International Conference on Advanced Thermal Processing of Semiconductors, RTP 2001

Volumn , Issue , 2001, Pages 190-196

Electromagnetic induction heating for cold wall rapid thermal processing

(7) Thompson, K a Booske, J H a Gianchandani, Y a Cooper, R a Bykov, Yu b Eremeev, A b Plotnikov, I b

a UNIVERSITY OF WISCONSIN MADISON (United States)

b INSTITUTE OF APPLIED PHYSICS (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL ACTIVATION; DOPING (ADDITIVES); ELECTRIC FIELDS; ELECTROMAGNETIC INDUCTION; HEAT TREATMENT; HEATING; MILLIMETER WAVES; NANOTECHNOLOGY; RAPID THERMAL PROCESSING; SEMICONDUCTOR JUNCTIONS; SILICON WAFERS;

BORON IMPLANTS; DIFFERENT FREQUENCY; DOPANT ACTIVATION; HIGH FREQUENCY ELECTRIC FIELDS; IMPLANTED DOPANTS; JUNCTION DEPTH; LOWER TEMPERATURES; TECHNOLOGY NODES;

INDUCTION HEATING;

EID: 84983146287 PISSN: None EISSN: None Source Type: Conference Proceeding
DOI: 10.1109/RTP.2001.1013765 Document Type: Conference Paper

Times cited : (11)

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