Plasma characterization of a plasma doping system for semiconductor device fabrication

IEEE International Conference on Plasma Science

Volumn , Issue , 2000, Pages 210-

  Koo, Bon Woong ^a   Felch, Susan ^a   Fang, Ziwei ^a  

^a Varian Semiconductor Equipment Associates Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACCELERATION; BORON; ELECTRIC POTENTIAL; ION IMPLANTATION; NITROGEN; PLASMA DENSITY; PLASMA PROBES; PLASMA SOURCES; POSITIVE IONS; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR DOPING; SILICON WAFERS;

ABSTRACT ONLY; PLASMA DOPING SYSTEM;

PLASMA APPLICATIONS;

EID: 0033723581     PISSN: 07309244     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

References (0)