Polymer brushes modified by photosensitive azobenzene containing polyamines

Polymer

Volumn 98, Issue , 2016, Pages 421-428

  Kopyshev, Alexey ^a   Galvin, Casey J ^b   Genzer, Jan ^b   Lomadze, Nino ^a   Santer, Svetlana ^a  

^a UNIVERSITY OF POTSDAM   (Germany)

^b North Carolina State University   (United States)

Author keywords

Photosensitive azobenzene containing polyamines; Photosensitive brushes

Indexed keywords

ACRYLIC MONOMERS; AMINES; ATOM TRANSFER RADICAL POLYMERIZATION; AZOBENZENE; CHAINS; DENDRIMERS; ESTERS; FREE RADICAL REACTIONS; IRRADIATION; LIGHT SENSITIVE MATERIALS; PHOTOSENSITIVITY; POLYACRYLATES; POLYELECTROLYTES;

AZOBENZENE SURFACTANT; INTENSITY DISTRIBUTION; POLY (METHACRYLIC ACID); POLYAMINES; POLYELECTROLYTE BLOCKS; SURFACTANT HEAD GROUPS; T-BUTYL METHACRYLATE; UV-INTERFERENCE PATTERN;

CATIONIC SURFACTANTS;

EID: 84977110952     PISSN: 00323861     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.polymer.2016.03.050     Document Type: Article

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