In-situ atomic force microscopy study of the mechanism of surface relief grating formation in photosensitive polymer films

Journal of Applied Physics

Volumn 113, Issue 22, 2013, Pages

  Yadavalli, Nataraja Sekhar ^a   Santer, Svetlana ^a  

^a UNIVERSITY OF POTSDAM   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPE (AFM); AZOBENZENE-CONTAINING POLYMER; ELECTRIC FIELD VECTORS; INTERFERENCE PATTERNS; LOCAL DISTRIBUTIONS; PHOTOSENSITIVE POLYMERS; SURFACE RELIEF GRATINGS; TWO-BEAM INTERFEROMETRY;

ATOMIC FORCE MICROSCOPY; ELECTRIC FIELDS; GEOGRAPHICAL DISTRIBUTION; LIGHT SENSITIVE MATERIALS; POLYMERS;

POLYMER FILMS;

EID: 84879222609     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4809640     Document Type: Article

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42. See supplementary material at http://dx.doi.org/10.1063/1.4809640 E-JAPIAU-113-005323 for details: Chromium mask is used to create the light intensity maxima and minima regions and the mass transport of polymer as a response to the light intensity is studied.