-
1
-
-
84934887317
-
-
D. Xu, D. Liu, B. Wang, C. Chen, Z. Chen, D. Li, Y. Yang, H. Chen, and M. G. Kong, PLoS One 10, e0128205 (2015). 10.1371/journal.pone.0128205
-
(2015)
PLoS One
, vol.10
, pp. e0128205
-
-
Xu, D.1
Liu, D.2
Wang, B.3
Chen, C.4
Chen, Z.5
Li, D.6
Yang, Y.7
Chen, H.8
Kong, M.G.9
-
2
-
-
54149093734
-
-
G. Fridman, G. Friedman, A. Gutsol, A. B. Shekhter, V. N. Vasilets, and A. Fridman, Plasma Process. Polym. 5, 503 (2008). 10.1002/ppap.200700154
-
(2008)
Plasma Process. Polym.
, vol.5
, pp. 503
-
-
Fridman, G.1
Friedman, G.2
Gutsol, A.3
Shekhter, A.B.4
Vasilets, V.N.5
Fridman, A.6
-
3
-
-
72049111528
-
-
M. G. Kong, G. Kroesen, G. Morfill, T. Nosenko, T. Shimizu, J. van Dijk, and J. L. Zimmermann, New J. Phys. 11, 115012 (2009). 10.1088/1367-2630/11/11/115012
-
(2009)
New J. Phys.
, vol.11
-
-
Kong, M.G.1
Kroesen, G.2
Morfill, G.3
Nosenko, T.4
Shimizu, T.5
Van Dijk, J.6
Zimmermann, J.L.7
-
4
-
-
84893644844
-
-
G. Collet, E. Robert, A. Lenoir, M. Vandamme, T. Darny, S. Dozias, C. Kieda, and J. M. Pouvesle, Plasma Sources Sci. Technol. 23, 012005 (2014). 10.1088/0963-0252/23/1/012005
-
(2014)
Plasma Sources Sci. Technol.
, vol.23
-
-
Collet, G.1
Robert, E.2
Lenoir, A.3
Vandamme, M.4
Darny, T.5
Dozias, S.6
Kieda, C.7
Pouvesle, J.M.8
-
5
-
-
84857507321
-
-
M. Vandamme, E. Robert, S. Lerondel, V. Sarron, D. Ries, S. Dozias, J. Sobilo, D. Gosset, C. Kieda, B. Legrain, J. M. Pouvesle, and A. L. Pape, Int. J. Cancer 130, 2185 (2012). 10.1002/ijc.26252
-
(2012)
Int. J. Cancer
, vol.130
, pp. 2185
-
-
Vandamme, M.1
Robert, E.2
Lerondel, S.3
Sarron, V.4
Ries, D.5
Dozias, S.6
Sobilo, J.7
Gosset, D.8
Kieda, C.9
Legrain, B.10
Pouvesle, J.M.11
Pape, A.L.12
-
6
-
-
84883450344
-
-
T. von Woedtke, S. Reuter, K. Masur, and K. D. Weltmann, Phys. Rep. 530, 291 (2013). 10.1016/j.physrep.2013.05.005
-
(2013)
Phys. Rep.
, vol.530
, pp. 291
-
-
Von Woedtke, T.1
Reuter, S.2
Masur, K.3
Weltmann, K.D.4
-
8
-
-
84945152127
-
-
S. Mohades, M. Laroussi, J. Sears, N. Barekzi, and H. Razavi, Phys. Plasmas 22, 122001 (2015). 10.1063/1.4933367
-
(2015)
Phys. Plasmas
, vol.22
-
-
Mohades, S.1
Laroussi, M.2
Sears, J.3
Barekzi, N.4
Razavi, H.5
-
9
-
-
84899821378
-
-
J. M. Plewa, M. Yousfi, C. Frongia, O. Eichwald, B. Ducommun, N. Merbahi, and V. Lobjois, New J. Phys. 16, 043027 (2014). 10.1088/1367-2630/16/4/043027
-
(2014)
New J. Phys.
, vol.16
-
-
Plewa, J.M.1
Yousfi, M.2
Frongia, C.3
Eichwald, O.4
Ducommun, B.5
Merbahi, N.6
Lobjois, V.7
-
12
-
-
84928565274
-
-
E. J. Szili, J. S. Oh, S. H. Hong, A. Hatta, and R. D. Short, J. Phys. D: Appl. Phys. 48, 202001 (2015). 10.1088/0022-3727/48/20/202001
-
(2015)
J. Phys. D: Appl. Phys.
, vol.48
-
-
Szili, E.J.1
Oh, J.S.2
Hong, S.H.3
Hatta, A.4
Short, R.D.5
-
13
-
-
84906568854
-
-
S. H. Hong, E. J. Szili, A. T. A. Jenkins, and R. D. Short, J. Phys. D: Appl. Phys. 47, 362001 (2014). 10.1088/0022-3727/47/36/362001
-
(2014)
J. Phys. D: Appl. Phys.
, vol.47
-
-
Hong, S.H.1
Szili, E.J.2
Jenkins, A.T.A.3
Short, R.D.4
-
14
-
-
84910090290
-
-
S. A. Norberg, W. Tian, E. Johnsen, and M. J. Kushner, J. Phys. D: Appl. Phys. 47, 475203 (2014). 10.1088/0022-3727/47/47/475203
-
(2014)
J. Phys. D: Appl. Phys.
, vol.47
-
-
Norberg, S.A.1
Tian, W.2
Johnsen, E.3
Kushner, M.J.4
-
15
-
-
18844445363
-
-
I. E. Kieft, D. Darios, A. J. M. Roks, and E. Stoffels, IEEE Trans. Plasma Sci. 33, 771 (2005). 10.1109/TPS.2005.844528
-
(2005)
IEEE Trans. Plasma Sci.
, vol.33
, pp. 771
-
-
Kieft, I.E.1
Darios, D.2
Roks, A.J.M.3
Stoffels, E.4
-
16
-
-
84954611672
-
-
T. Kaneko, S. Sasaki, Y. Hokari, S. Horiuchi, and R. Honda, Biointerphases 10, 029521 (2015). 10.1116/1.4921278
-
(2015)
Biointerphases
, vol.10
-
-
Kaneko, T.1
Sasaki, S.2
Hokari, Y.3
Horiuchi, S.4
Honda, R.5
-
18
-
-
80054711209
-
-
K. Oehmigen, J. Winter, M. Hahnel, C. Wilke, R. Brandenburg, K. D. Weltmann, and T. von Woedtke, Plasma Process. Polym. 8, 904 (2011). 10.1002/ppap.201000099
-
(2011)
Plasma Process. Polym.
, vol.8
, pp. 904
-
-
Oehmigen, K.1
Winter, J.2
Hahnel, M.3
Wilke, C.4
Brandenburg, R.5
Weltmann, K.D.6
Von Woedtke, T.7
-
19
-
-
84914816137
-
-
F. Tochikubo, Y. Shimokawa, N. Shirai, and S. Uchida, Jpn. J. Appl. Phys., Part 1 53, 126201 (2014). 10.7567/JJAP.53.126201
-
(2014)
Jpn. J. Appl. Phys., Part 1
, vol.53
-
-
Tochikubo, F.1
Shimokawa, Y.2
Shirai, N.3
Uchida, S.4
-
20
-
-
84876488273
-
-
C. A. J. van Gils, S. Hofmann, B. K. H. L. Boekema, R. Brandenburg, and P. J. Bruggeman, J. Phys. D: Appl. Phys. 46, 175203 (2013). 10.1088/0022-3727/46/17/175203
-
(2013)
J. Phys. D: Appl. Phys.
, vol.46
-
-
Van Gils, C.A.J.1
Hofmann, S.2
Boekema, B.K.H.L.3
Brandenburg, R.4
Bruggeman, P.J.5
-
21
-
-
79957687348
-
-
S. Kanazawa, H. Kawano, S. Watanabe, T. Furuki, S. Akamine, R. Ichiki, T. Ohkubo, M. Kocik, and J. Mizeraczyk, Plasma Sources Sci. Technol. 20, 034010 (2011). 10.1088/0963-0252/20/3/034010
-
(2011)
Plasma Sources Sci. Technol.
, vol.20
-
-
Kanazawa, S.1
Kawano, H.2
Watanabe, S.3
Furuki, T.4
Akamine, S.5
Ichiki, R.6
Ohkubo, T.7
Kocik, M.8
Mizeraczyk, J.9
-
22
-
-
84873035718
-
-
S. Kanazawa, T. Furuki, T. Nakaji, S. Akamine, and R. Ichiki, Int. J. Plasma Environ. Sci. Technol. 6, 166 (2012).
-
(2012)
Int. J. Plasma Environ. Sci. Technol.
, vol.6
, pp. 166
-
-
Kanazawa, S.1
Furuki, T.2
Nakaji, T.3
Akamine, S.4
Ichiki, R.5
-
23
-
-
84859865684
-
-
H. Wu, P. Sun, H. Feng, H. Zhou, R. Wang, Y. Liang, J. Lu, W. Zhu, J. Zhang, and J. Fang, Plasma Processes Polym. 9, 417 (2012). 10.1002/ppap.201100065
-
(2012)
Plasma Processes Polym.
, vol.9
, pp. 417
-
-
Wu, H.1
Sun, P.2
Feng, H.3
Zhou, H.4
Wang, R.5
Liang, Y.6
Lu, J.7
Zhu, W.8
Zhang, J.9
Fang, J.10
-
24
-
-
84886048701
-
-
H. Tresp, M. U. Hammer, J. Winter, K. D. Weltmann, and S. Reuter, J. Phys. D: Appl. Phys. 46, 435401 (2013). 10.1088/0022-3727/46/43/435401
-
(2013)
J. Phys. D: Appl. Phys.
, vol.46
-
-
Tresp, H.1
Hammer, M.U.2
Winter, J.3
Weltmann, K.D.4
Reuter, S.5
-
25
-
-
77950192922
-
-
F. Liu, P. Sun, N. Bai, Y. Tian, H. Zhou, S. Wei, Y. Zhou, J. Zhang, W. Zhu, K. Becker, and J. Fang, Plasma Processes Polym. 7, 231 (2010). 10.1002/ppap.200900070
-
(2010)
Plasma Processes Polym.
, vol.7
, pp. 231
-
-
Liu, F.1
Sun, P.2
Bai, N.3
Tian, Y.4
Zhou, H.5
Wei, S.6
Zhou, Y.7
Zhang, J.8
Zhu, W.9
Becker, K.10
Fang, J.11
-
27
-
-
84903442895
-
-
T. Kawasaki, K. Kawano, H. Mizoguchi, Y. Yano, K. Yamashita, M. Sakai, G. Uchida, K. Koga, and M. Shiratani, J. Phys.: Conf. Ser. 518, 012016 (2014) 10.1088/1742-6596/518/1/012016.
-
(2014)
J. Phys.: Conf. Ser.
, vol.518
-
-
Kawasaki, T.1
Kawano, K.2
Mizoguchi, H.3
Yano, Y.4
Yamashita, K.5
Sakai, M.6
Uchida, G.7
Koga, K.8
Shiratani, M.9
-
28
-
-
84908457787
-
-
T. Kawasaki, K. Kawano, H. Mizoguchi, Y. Yano, K. Yamashita, M. Sakai, T. Shimizu, G. Uchida, K. Koga, and M. Shiratani, IEEE Trans. Plasma Sci. 42, 2482 (2014). 10.1109/TPS.2014.2325038
-
(2014)
IEEE Trans. Plasma Sci.
, vol.42
, pp. 2482
-
-
Kawasaki, T.1
Kawano, K.2
Mizoguchi, H.3
Yano, Y.4
Yamashita, K.5
Sakai, M.6
Shimizu, T.7
Uchida, G.8
Koga, K.9
Shiratani, M.10
-
29
-
-
84938151674
-
-
A. Nakajima, G. Uchida, T. Kawasaki, K. Koga, T. Sarinont, T. Amano, K. Takenaka, M. Shiratani, and Y. Setsuhara, J. Appl. Phys. 118, 043301 (2015). 10.1063/1.4927217
-
(2015)
J. Appl. Phys.
, vol.118
-
-
Nakajima, A.1
Uchida, G.2
Kawasaki, T.3
Koga, K.4
Sarinont, T.5
Amano, T.6
Takenaka, K.7
Shiratani, M.8
Setsuhara, Y.9
-
30
-
-
84962808904
-
-
T. Kawasaki, K. Kawano, H. Mizoguchi, Y. Yano, K. Yamashita, and M. Sakai, Int. J. Plasma Environ. Sci. Technol. 10, 41 (2016).
-
(2016)
Int. J. Plasma Environ. Sci. Technol.
, vol.10
, pp. 41
-
-
Kawasaki, T.1
Kawano, K.2
Mizoguchi, H.3
Yano, Y.4
Yamashita, K.5
Sakai, M.6
-
31
-
-
84938358092
-
-
T. Kawasaki, W. Eto, M. Hamada, Y. Wakabayashi, Y. Abe, and K. Kihara, Jpn. J. Appl. Phys., Part 1 54, 086201 (2015). 10.7567/JJAP.54.086201
-
(2015)
Jpn. J. Appl. Phys., Part 1
, vol.54
-
-
Kawasaki, T.1
Eto, W.2
Hamada, M.3
Wakabayashi, Y.4
Abe, Y.5
Kihara, K.6
-
33
-
-
0042864512
-
-
T. Kondo, J. Nishimura, H. Kitagawa, S. Umemura, K. Tachibana, and K. Toyosawa, J. Med. Ultrasonics 30, 93 (2003). 10.1007/BF02481369
-
(2003)
J. Med. Ultrasonics
, vol.30
, pp. 93
-
-
Kondo, T.1
Nishimura, J.2
Kitagawa, H.3
Umemura, S.4
Tachibana, K.5
Toyosawa, K.6
-
34
-
-
0037405940
-
-
S. Koda, T. Kimura, T. Kondo, and H. Mitome, Ultrason. Sonochem. 10, 149 (2003). 10.1016/S1350-4177(03)00084-1
-
(2003)
Ultrason. Sonochem.
, vol.10
, pp. 149
-
-
Koda, S.1
Kimura, T.2
Kondo, T.3
Mitome, H.4
-
39
-
-
35848959712
-
-
Y. Asakura, T. Nishida, T. Matsuoka, and S. Koda, Ultrason. Sonochem. 15, 244 (2008). 10.1016/j.ultsonch.2007.03.012
-
(2008)
Ultrason. Sonochem.
, vol.15
, pp. 244
-
-
Asakura, Y.1
Nishida, T.2
Matsuoka, T.3
Koda, S.4
-
41
-
-
79956319032
-
-
T. Shimizu, Y. Iwafuchi, G. E. Morfill, and T. Sato, New J. Phys. 13, 053025 (2011). 10.1088/1367-2630/13/5/053025
-
(2011)
New J. Phys.
, vol.13
-
-
Shimizu, T.1
Iwafuchi, Y.2
Morfill, G.E.3
Sato, T.4
-
42
-
-
84908430610
-
-
P. Rumbach, N. Griggs, R. M. Sankaran, and D. B. Go, IEEE Trans. Plasma Sci. 42, 2610 (2014). 10.1109/TPS.2014.2322976
-
(2014)
IEEE Trans. Plasma Sci.
, vol.42
, pp. 2610
-
-
Rumbach, P.1
Griggs, N.2
Sankaran, R.M.3
Go, D.B.4
-
44
-
-
84904049451
-
-
M. Boselli, V. Colombo, E. Ghedini, M. Gherardi, R. Laurita, A. Liguori, P. Sanibondi, and A. Stancampiano, Plasma Chem. Plasma Process. 34, 853 (2014). 10.1007/s11090-014-9537-1
-
(2014)
Plasma Chem. Plasma Process.
, vol.34
, pp. 853
-
-
Boselli, M.1
Colombo, V.2
Ghedini, E.3
Gherardi, M.4
Laurita, R.5
Liguori, A.6
Sanibondi, P.7
Stancampiano, A.8
-
45
-
-
78349262668
-
-
N. Georgescu, C. P. Lungu, A. R. Lupu, and M. Osiac, IEEE Trans. Plasma Sci. 38, 3156 (2010). 10.1109/TPS.2010.2070811
-
(2010)
IEEE Trans. Plasma Sci.
, vol.38
, pp. 3156
-
-
Georgescu, N.1
Lungu, C.P.2
Lupu, A.R.3
Osiac, M.4
-
47
-
-
85027936722
-
-
G. Uchida, K. Takenaka, K. Kawabata, and Y. Setsuhara, IEEE Trans. Plasma Sci. 43, 737 (2015). 10.1109/TPS.2014.2387064
-
(2015)
IEEE Trans. Plasma Sci.
, vol.43
, pp. 737
-
-
Uchida, G.1
Takenaka, K.2
Kawabata, K.3
Setsuhara, Y.4
-
48
-
-
65549137615
-
-
S. Reuter, K. Niemi, V. S. von der Gathen, and H. F. Dobele, Plasma Sources Sci. Technol. 18, 015006 (2009). 10.1088/0963-0252/18/1/015006
-
(2009)
Plasma Sources Sci. Technol.
, vol.18
-
-
Reuter, S.1
Niemi, K.2
Von Der Gathen, V.S.3
Dobele, H.F.4
-
49
-
-
84897494427
-
-
T. Murakami, K. Niemi, T. Gans, D. O'Connell, and W. G. Graham, Plasma Sources Sci. Technol. 23, 025005 (2014). 10.1088/0963-0252/23/2/025005
-
(2014)
Plasma Sources Sci. Technol.
, vol.23
-
-
Murakami, T.1
Niemi, K.2
Gans, T.3
O'Connell, D.4
Graham, W.G.5
-
51
-
-
84892380908
-
-
R. Wild, T. Gerling, R. Bussiahn, K. D. Weltmann, and L. Stollenwerk, J. Phys. D: Appl. Phys. 47, 042001 (2014). 10.1088/0022-3727/47/4/042001
-
(2014)
J. Phys. D: Appl. Phys.
, vol.47
-
-
Wild, R.1
Gerling, T.2
Bussiahn, R.3
Weltmann, K.D.4
Stollenwerk, L.5
|