Copper etching: New chemical approaches

MRS Bulletin

Volumn 18, Issue 6, 1993, Pages 39-45

  Hampden Smith, Mark J ^a   Kodas, Toivo T ^a  

^a NONE

Author keywords

[No Author keywords available]

Indexed keywords

EID: 84971173801     PISSN: 08837694     EISSN: 19381425     Source Type: Journal    
DOI: 10.1557/S088376940004731X     Document Type: Article

References (5)

1. N. Awaya and Y. Arita, J. Electron. Mater. 21 (1992) p. 959.
2. M.J. Hampden-Smith and T.T. Kodas, Chemical Aspects of Chemical Vapor Deposition for Metallization, Verlag, to be published, 1993.
3. D.E. Driesburg and E.D. Castel, J. Met. (1989) p. 23.
4. M.L. Green and R.A. Levy, J. Met. (1985) p. 63.
5. J. Met. 1985 63