Improvement in morphology of nickel silicide film with carbon

Extended Abstracts of the 3rd International Workshop on Junction Technology, IWJT 2002

Volumn , Issue , 2002, Pages 71-72

  Nakatsuka, O ^a   Tsuchiya, Y ^a   Sakai, A ^a   Zaima, S ^a   Murota, J ^b   Yasuda, Y ^a  

^a NAGOYA UNIVERSITY   (Japan)

^b TOHOKU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 84963600639     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/IWJT.2002.1225207     Document Type: Conference Paper

References (2)

1. Y. Tsuchiya, A. Tobioka, O. Nakatsuka, H. Ikeda, A. Sakai, S. Zaima, and Y. Yasuda: "Electrical Properties and Solid-Phase Reactions in Ni/Si(100) Contacts", Jpn. J. Appl. Phys. 41 (2002) pp. 2450-2454.
2. 2 Formation on (100)Si", Jpn. J. Appl. Phys. 29 (1990) pp. L2329-L2332.