Precise beam incidence angle control on the VIISta 810HP

Proceedings of the International Conference on Ion Implantation Technology

Volumn 22-27-September-2002, Issue , 2002, Pages 276-278

  Weeman, J ^a   Olson, J ^a   Guo, B N ^a   Jeong, U ^a   Li, G C ^a   Mehta, S ^a  

^a VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES   (United States)

Author keywords

Calibration; Electrical resistance measurement; Hardware; Implants; Ion beams; Performance evaluation; Silicon; Size control; Testing; Thermal resistance

Indexed keywords

CALIBRATION; COMPUTER HARDWARE; DENTAL PROSTHESES; HARDWARE; HEAT RESISTANCE; ION BEAMS; ION IMPLANTATION; IONS; RECONFIGURABLE HARDWARE; SILICON; TESTING;

ANGLE OF INCIDENCE; BEAM INCIDENCE ANGLE; CALIBRATION CURVES; CALIBRATION TECHNIQUES; ELECTRICAL RESISTANCE MEASUREMENT; HARDWARE AND SOFTWARE; PERFORMANCE EVALUATION; SIZE CONTROL;

SILICON WAFERS;

EID: 84961309923     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/IIT.2002.1257992     Document Type: Conference Paper

References (2)

1. U. Jeong, J. Jin and S. Mehta "Devices Dictate Control of Implant-Beam Incident Angle," Solid State Technology, R. Haavind, J. MacShane, P. Burggraaf, eds. Tulsa, OK, October 2001.
2. J. C. Olson and A. Renau "Control of Channeling Uniformity for Advanced Applications," 2000 International Conference on Ion Implantation Technology Proceedings, Alpbach, Austria, H. Ryssel, L. Frey, J. Gyulai, H. Glawischnig, eds. Piscataway, NJ:IEEE 2000, pp. 670-673.