Investigation of the high temperature stability of TiN-Al2O3-TiN capacitors for sub 50nm deep trench DRAM

ESSDERC 2006 - Proceedings of the 36th European Solid-State Device Research Conference

Volumn 2006-January, Issue , 2006, Pages 391-394

  Boscke T ^a,b   Kudelka, S ^a   Sanger A ^a   Muller J ^b   Krautschneider, W ^b  

^a QIMONDA DRESDEN GMBH AND CO OHG   (Germany)

^b HAMBURG UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; ALUMINUM OXIDE; DEGRADATION; MIM DEVICES; THERMODYNAMIC STABILITY; TITANIUM OXIDES;

DEEP TRENCH; DEGRADATION MECHANISM; HIGH TEMPERATURE; HIGH TEMPERATURE STABILITY; MIM CAPACITORS; PHYSICAL CHARACTERIZATION; THERMALLY STABLE;

TITANIUM NITRIDE;

EID: 84957863714     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/essder.2006.307720     Document Type: Conference Paper

References (8)

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