Revealing the mechanism, pathways and kinetics of UV254nm/H2O2-based degradation of model active sunscreen ingredient PBSA

Chemical Engineering Journal

Volumn 288, Issue , 2016, Pages 824-833

  Abdelraheem, Wael H M ^a,b   He, Xuexiang ^b,c   Komy, Zanaty R ^a   Ismail, Nabawia M ^a   Dionysiou, Dionysios D ^b,c  

^a Sohag University   (Egypt)

^b UNIVERSITY OF CINCINNATI   (United States)

^c UNIVERSITY OF CYPRUS   (Cyprus)

Author keywords

2 Phenylbenzimidazole 5 sulfonic acid (PBSA); Hydroxyl radical; Mineralization; Sunscreen agent; Transformation byproducts; UV254nm H2O2 AOP

Indexed keywords

BYPRODUCTS; DEGRADATION; HAZARDS; KINETICS; MASS SPECTROMETRY; MINERALOGY; PHOTODEGRADATION; PHOTOLYSIS; POLLUTION; RATE CONSTANTS; SUN HOODS;

2-PHENYLBENZIMIDAZOLE-5-SULFONIC ACID (PBSA); HYDROXYL RADICALS; MINERALIZATION; SUNSCREEN AGENTS; TRANSFORMATION BY-PRODUCTS; UV254NM/H2O2 AOP;

WATER TREATMENT;

EID: 84952837316     PISSN: 13858947     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cej.2015.12.046     Document Type: Article

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