AFM probe tips using heavily boron-doped silicon cantilevers realized in a <110> bulk silicon wafer

Digest of Papers - 2000 International Microprocesses and Nanotechnology Conference, MNC 2000

Volumn , Issue , 2000, Pages 230-231

  Cho, Il Joo ^a   Park, Eun Chul ^a   Yoon, Euisik ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; NANOCANTILEVERS; NANOTECHNOLOGY; PROBES; SILICON;

ANISOTROPIC SILICON; BORON-DOPED; BORON-DOPED SILICON; DIMENSION CONTROL; FABRICATION PROCESS; NON-UNIFORMITIES; SELF-ALIGNED; SOI WAFERS;

SILICON WAFERS;

EID: 84951951200     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/IMNC.2000.872729     Document Type: Conference Paper

References (3)

1. M. Lutwyche, C. Andreoli, G. Binnig, and P. Vettiger, MEMS'98 Proceedings, p. 8, 1998.
2. T. R. Albrecht, S. Akamine, T. E. Carver, and C. F. Quate, JVST, A8, p. 3386, 1990.
3. T. A. Kovacs and E. Petersen, Proceedings of IEEE, p. 1536, 1998.