Study of limitations on pixel size of very high resolution image sensors

National Radio Science Conference, NRSC, Proceedings

Volumn 1, Issue , 2001, Pages 15-28

  Eid, E S ^a,b  

^a Photobit Technology Corporation   (United States)

^b ALEXANDRIA UNIVERSITY   (Egypt)

Author keywords

CMOS image sensors; CMOS process; Costs; Employment; Image resolution; Image sensors; Lithography; Optical crosstalk; Optical sensors; Pixel

Indexed keywords

CMOS INTEGRATED CIRCUITS; COSTS; CROSSTALK; EMPLOYMENT; IMAGE PROCESSING; IMAGE RESOLUTION; IMAGE SENSORS; LIGHT; LITHOGRAPHY; OPTICAL SENSORS; SUPERCONDUCTING MATERIALS;

CMOS ACTIVE PIXEL SENSORS; CMOS IMAGE SENSOR; CMOS PROCESSS; COLOR IMAGE SENSORS; OPTICAL CROSS-TALK; REDUCED SENSITIVITY; VERY HIGH RESOLUTION; VERY HIGH RESOLUTION (VHR) IMAGE;

PIXELS;

EID: 84951931762     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/NRSC.2001.929154     Document Type: Conference Paper

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