Enhancing of catalytic properties of vanadia via surface doping with phosphorus using atomic layer deposition

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 34, Issue 1, 2016, Pages

  Strempel, Verena E ^a   Löffler, Daniel ^a   Kröhnert, Jutta ^c   Skorupska, Katarzyna ^c   Johnson, Benjamin ^c   D'Alnoncourt, Raoul Naumann ^a   Driess, Matthias ^a   Rosowski, Frank ^a,b  

^a TECHNISCHE UNIVERSITÄT BERLIN   (Germany)

^b BASF SE   (Germany)

^c FRITZ HABER INSTITUT DER MAX PLANCK GESELLSCHAFT   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC LAYER DEPOSITION; ATOMS; CATALYSTS; CATALYTIC OXIDATION; DEPOSITS; FILM PREPARATION; MALEIC ANHYDRIDE; OXIDATION; PHOSPHORUS; SEMICONDUCTOR DOPING; SUBSTRATES; VANADIUM;

CATALYST POWDERS; CATALYTIC PERFORMANCE; CATALYTIC PROPERTIES; INCIPIENTWETNESS IMPREGNATION; OXIDATION OF N-BUTANE; REACTION CONDITIONS; TOTAL OXIDATION; VANADYL PYROPHOSPHATE;

DEPOSITION;

EID: 84949665611     PISSN: 07342101     EISSN: 15208559     Source Type: Journal    
DOI: 10.1116/1.4936390     Document Type: Article

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