High aspect ratio Plasmonic nanocones for enhanced light absorption in ultrathin amorphous silicon films

Journal of Physical Chemistry C

Volumn 118, Issue 40, 2014, Pages 22840-22846

  Gusak, V ^a   Kasemo, B ^a   Hagglund C ^b,c  

^a CHALMERS UNIVERSITY OF TECHNOLOGY   (Sweden)

^b Stanford University   (United States)

^c UPPSALA UNIVERSITY   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; ASPECT RATIO; CHEMICAL VAPOR DEPOSITION; FINITE ELEMENT METHOD; LIGHT ABSORPTION; METALLIC FILMS; NANOSTRUCTURES; PLASMONS; REFLECTION; SILICON; SILICON SOLAR CELLS; SILVER; SOLAR POWER GENERATION; SURFACE PLASMON RESONANCE; ULTRATHIN FILMS;

AMORPHOUS SILICON FILM; ENHANCED LIGHT ABSORPTIONS; FINITE-ELEMENT CALCULATIONS; GEOMETRICAL EFFECT; HYDROGENATED AMORPHOUS SILICON (A-SI:H) FILMS; NANOPARTICLE PLASMON RESONANCES; NUMERICAL COMPARISON; PLASMON RESONANCES;

AMORPHOUS SILICON;

EID: 84949117344     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp504916p     Document Type: Article

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