SCOPUS 정보 검색 플랫폼

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 43, Issue 6 A, 2004, Pages 3257-3268

Staebler-Wronski effect in hydrogenated amorphous silicon and related alloy films

a NONE (Japan)

Author keywords

Degradation; Hydrogenated amorphous silicon; Light soaking; Metastable defects; Photocreation of dangling bonds; Solar cells; Staebler wronski effect; Thin film transistors

Indexed keywords

ACTIVATION ENERGY; ALLOYS; DEGRADATION; FERMI LEVEL; HYDROGENATION; LIQUID CRYSTAL DISPLAYS; MATHEMATICAL MODELS; PHOTOCONDUCTIVITY; SOLAR CELLS; THIN FILM TRANSISTORS;

HYDROGENATED AMORPHOUS SILICON; LIGHT SOAKING (LS); METASTABLE DEFECTS; PHOTOCREATION OF DANGLING BONDS; STAEBLER-WRONSKI (SW) EFFECT;

AMORPHOUS SILICON;

EID: 4344668571 PISSN: 00214922 EISSN: None Source Type: Journal
DOI: 10.1143/JJAP.43.3257 Document Type: Article

Times cited : (94)

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